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Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

    Buy cheap Pure Chromium Plate Sputtering Targets With High Corrosion Resistance from wholesalers
     
    Buy cheap Pure Chromium Plate Sputtering Targets With High Corrosion Resistance from wholesalers
    • Buy cheap Pure Chromium Plate Sputtering Targets With High Corrosion Resistance from wholesalers
    • Buy cheap Pure Chromium Plate Sputtering Targets With High Corrosion Resistance from wholesalers
    • Buy cheap Pure Chromium Plate Sputtering Targets With High Corrosion Resistance from wholesalers

    Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

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    Brand Name : JINXING
    Model Number : Chromium Plate Sputtering Target
    Certification : ISO 9001
    Price : 20~100USD/kg
    Payment Terms : L/C, D/A, D/P, T/T, Western Union
    Supply Ability : 100000kgs/M
    Delivery Time : 10~25 work days
    • Product Details
    • Company Profile

    Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

    Chromium Plate Sputtering Target

    Chromium plate sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal


    • Description

    Chromium Sputtering Target, Chromium Target are available in varying sizes


    The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.


    Grades:Chrome Sputtering target
    Purity: 99.5%, 99.9%, 99.95%
    Chromium AlloyAlCr, CrAl, CrSi, TiCr etc
    Density:7.19g/cm3
    Shape:Round Shape , Tube Shape and Plate Shape.

    Sizes:


    Plate sputtering targets:


    Thickness: 0.04 to 1.40" (1.0 to 35mm).

    Width up to 20"(50 to 500mm).

    Length: 3.9" to 6.56 feet( 100-2000mm)

    other sizes as requested.

    Cylinder sputtering targets:


    3.94 Dia. x 1.58"(100 Dia. x 40mm)

    2.56 Dia. x 1.58" (65 Dia. x 40mm)

    or 63*32mm other sizes as requested.


    Tube sputtering targets:


    2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

    3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

    other sizes as requested.


    The effect of different processing methods on the sintering density of chromium target. In the process of mechanical pressing, two-way pressing is adopted without any molding agent and deoxidizer. The target density of Cr ring is 78% - 80% by mechanical pressing + vacuum sintering; the target density of Cr plate sputtering target is more than 82% by cold isostatic pressing + vacuum sintering; after rolling, the target density of Cr plate is increased to 90% - 95%; the sputtering target density of Cr alloy is more than 98% by hot pressing. By optimizing the sintering time and temperature, the sintering cost of chromium ring target is greatly reduced.


    Application:


    1. Metal chromium purity 99% - 99.5%: used for alloy additives, cermet, powder metallurgy, hard alloy, diamond tools, diamond products, electrical alloy, flux cored wire, welding materials, aluminum alloy additives, thermal spraying materials, high temperature and high wear-resistant materials, optical coating materials, chemical products, etc.


    2. Purity of metal chromium 99.5% - 99.9%: used for physical vapor deposition, high temperature alloy, hot isostatic pressing chromium target raw materials, cermet, hard alloy addition, welding materials, diamond tools, laser cladding, spraying, etc.


    3. The purity of metal chromium is more than 99.9%; it is used for aerospace materials, steam turbines, coating targets, etc.


    TypeApplicationMain alloyRequest
    SemiconductorPreparation of core materials for integrated circuitsW. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N

    Highest technical requirements, ultra-high purity metal, high precision size, high integration


    Screen DisplaySputtering technology ensures uniformity of film production, improves productivity and reduces costNiobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target

    High technical requirements, high-purity materials, large material area and high degree of uniformity


    DecorateIt is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance

    Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target


    mainly used for decoration, energy saving, etc
    Tooling

    Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts


    TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etcHigh performance requirements and long service life
    Solar photovoltaicSputtered thin film technology for the fabrication of the fourth generation thin film solar cellsZinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etcWide Application
    Electronic accessories

    For film resistance and film capacitance


    NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etcSmall size, good stability and small resistance temperature coefficient are required for electronic devices
    Information storage

    For making magnetic memory


    Cr based, Co based, CO Fe based, Ni based alloysHigh storage density, high transmission speed

    Quality Pure Chromium Plate Sputtering Targets With High Corrosion Resistance for sale
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