Chromium Tube Sputtering Target, Chromium Pipe Sputtering Target are available in varying sizes
1. The purity of high purity chromium target is 99.5%, 99.8%,
99.95%, 99.99%
2. Common specifications of high-purity chromium target:
high-purity chromium tube target, high-purity chromium ring target,
length 20-400mm, diameter 50-120mm, tube thickness 5-10mm. TiO2,
TiB2, Ti3O5, etc. can be plasma sprayed on the chromium tube
target, customized according to your requirements.
3. Production process of high purity chromium target: hot isostatic
pressing, powder metallurgy.
4. High purity chromium particles: common particle sizes are:
1-3mm, 3-5mm, 40 mesh, - 20-300 mesh, 40 × 60 × 80 × 200 × for
evaporation coating, with high purity and good evaporation effect.
5. High purity chromium strip: Ø 0.3, Ø 0.5, Ø 1.0, etc.
6. Relevant parameters of high-purity chromium: Formula: Cr
7. Appearance: silver gray
8. Specification: grain, powder, target material, bar.
| Grades: | Chrome Sputtering target |
| Purity: 99.5%, 99.9%, 99.95% |
| Chromium Alloy |
AlCr, CrAl, CrSi, TiCr etc |
| Density: | 7.19g/cm3 |
| Shape: | Round Shape , Tube Shape and Plate Shape. |
Through hot (cold) isostatic pressing, metal smelting and powder
metallurgy, our company specializes in producing various magnetron
sputtering targets: chromium target, aluminum target, copper
target, silver target, zinc aluminum target, copper indium gallium
selenium target, copper indium target, copper indium gallium
target, germanium antimony tellurium target, lanthanum strontium
manganese oxide target, iron bismuth manganese oxide target,
chromium target, nickel chromium target, zinc target, aluminum
target, magnesium target, hafnium target, scandium target, silicon
target, silicon target, tellurium target, niobium target, tantalum
target, Cobalt chromium target, aluminum iridium target, Iron
chromium aluminum iridium target, boron carbide target, boron
nitride target, titanium nitride target, monocrystalline silicon
target, polycrystalline silicon target, silicon dioxide target,
titanium dioxide target, aluminum oxide target, strontium titanate
target, barium titanate target, zirconia target, hafnium oxide
target, copper oxide target, manganese oxide target, magnesium
oxide target, zinc oxide target, zinc sulfide target, cadmium
sulfide target, boron nitride target, silicon carbide target,
yttrium oxide target, zinc oxide target, strontium titanate target,
Silver indium antimony tellurium alloy target, Indium Telluride
target, ruthenium target, palladium target, iridium target, gold
target, platinum target, silver target, osmium target, azo target,
ITO target, cadmium telluride target, cadmium sulfide target, zinc
telluride target, indium selenide target, copper selenide target,
lanthanum strontium manganese oxide and other metal targets, alloy
target, ceramic target, monocrystalline silicon substrate, silicon
oxide substrate, alumina substrate, etc. Mainly according to the
specific requirements of customers, we process various
specifications and target materials of various ingredients. Our
products are of higher quality, lower price and short delivery
time. We maintain good business contacts with many domestic coating
factories, coating machine manufacturers, scientific research
institutions and domestic and foreign universities. At present, our
company is providing customers with common growth and development space with
high-quality products, systematic services and scientific
management.
